XYALIS at DAC conference 2017 : booth #2129

After 2 years, the long migration started in 2015 has just ended and we are proud to announce that the results are beyond our best expectations.

Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything!

XYALIS has just launchedย a new generation of his tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the challenges of today’s most advanced processes, with a focus on speed and memory usage.

Visit us on booth #2129 to know more about what we have achieved at the next Design Automation Conference, June 19-21, 2017, in Austin, Texas, USA.

To address the exploding data sizes of today’s most challenging mask sets XYALIS phases in a new generation of fully integrated mask-data preparation tools, which automate the most repetitive and time demanding steps of mask creation:

  • Automated frame generation based on intuitive reusable process templates,
  • Advanced placement engine for Multi-Project Wafers (MPWs) optimizing production costs,
  • Automated maskset layout editor with wafer map optimization supporting MLRs, 1X masks, and MEMS.
  • Collaborative web-based environments for MPW specification and SEMI-P10 compliant mask order generation.

XYALIS introduces GOTstyle, a newly redesigned CMP fill engine, delivering unsurpassed performance for the most advanced processes.
GOTstyle accommodates complex CMP fill rules, keeps a strict compatibility with DRCs, and dramatically reduces parasitics and impact on timing. Designed to address the most challenging digital and analog designs, GOTstyle minimizes memory usage and computation times.


XYALIS introduces a newly redesigned layout manipulation toolbox (layout integrity checking, layout merging, layout viewing, format translators…) based on a native OASIS.MASK internal representation, able to handle the largest designs with optimum performance and memory usage.

  • Monday, June 19 from 10:00 am to 6:00 pm
  • Tuesday, June 20 from 10:00 am to 6:00 pm
  • Wednesday, June 21 from 10:00 am to 6:00 pm

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