Mask Data Preparation
- Generation of Multi Project Wafers (MPWs) or shuttles
- Generation of complex reticles
- Intuitive mask set creation
Dummy Filling
- 3rd Generation of dummy filling
- High speed parallel processing
- Available at chip level, reticle level or wafer level
Toolbox
- Powerful toolbox for GDSII, OASIS ®, Mebes operations
- High reliability for last minute updates
- Secure your tapeout
XYALIS at DAC conference 2022 : booth #2455
May 19th, 2022
This year at DAC, XYALIS introduces new exciting features in its Mask Data Preparation field of expertise. Thanks to our frame generation automatic tool latest version, GOTframe, producing ultimate 3D frame chips has never been... [Continue Reading]
News & Press
April’22: New Release
April 19th, 2022 - News Grenoble – April 19th, 2022 – Today XYALIS unveils a new release bringing powerful improvements in the multi project wafer editor (GOTmuch) and in the frame generation engine (GOTframe). GOTmuch – Multi Project Wafer Editor... [Continue Reading]
XYALIS at DAC conference 2021 : booth #1407
October 19th, 2021 - News This year at DAC, XYALIS introduces optimized flows in its two areas of expertise. A new Multi-Project Wafer (MPW) design flow reduces thermal mechanical stress on reticules and improves MPW yield, by leveraging its production-proven... [Continue Reading]
Design Driven Dummy Filling
July 21st, 2021 - News XYALIS has set up a new methodology to allow an efficient design driven dummy filling technique. It is used in our dummy filling tool GOTstyle. The result has been presented in a paper during the 2021... [Continue Reading]
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To build reliable flows involving data exchange with other tools and equipments, XYALIS is fully compliant with SEMI standards. |
