Mask Data Preparation
- Generation of Multi Project Wafers (MPWs) or shuttles
- Generation of complex reticles
- Intuitive mask set creation
Dummy Filling
- 3rd Generation of dummy filling
- High speed parallel processing
- Available at chip level, reticle level or wafer level
Toolbox
- Powerful toolbox for GDSII, OASIS ®, Mebes operations
- High reliability for last minute updates
- Secure your tapeout
Reducing stress effect on MPW reticles
Grenoble – Feb. 22nd, 2021
Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodolgy to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online conference, California, USA, 22-26 february 2021.
News & Press
Reducing stress effects on multi-project-wafer reticles
March 11th, 2021 - News Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodolgy to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online... [Continue Reading]
Spie 2020 – Baccus : Maskset automatic flow
October 22nd, 2020 - News This year SPIE Advanced Lithography conference was online. Here is XYALIS presentation that shows a complete maskset automatic flow management with its mask order form in SEMI P10 format. In this presentation, we see how... [Continue Reading]
Oct’20: New Release
October 20th, 2020 - News Grenoble – October 20th, 2020 – Today XYALIS unveils a new release bringing new powerful features in mask data preparation and dummy filling tools. It includes a python interpreter for maskset manager and dummy fill tool.... [Continue Reading]
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To build reliable flows involving data exchange with other tools and equipments, XYALIS is fully compliant with SEMI standards. |
