Mask Data Preparation

  • Generation of Multi Project Wafers (MPWs) or shuttles
  • Generation of complex reticles
  • Intuitive mask set creation
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  • Powerful toolbox for GDSII/OASIS ®/Mebes operations
  • Direct read and write gzip files
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Dummy Filling

  • 3rd Generation of dummy filling
  • High speed parallel processing
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Layout database comparator:

  • Geometry-based signature
  • Ultra-fast signature comparison
  • Intellectual property protection
  • High performance XOR
  • Standard error file generation
  • Parallelism for unsurpassed performance
  • Client/server mode for GUI customization

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Xyalis - New MDP Product

News & Press

Geometry-based signature for layout database comparison

- Grenoble 31st may 2018, XYALIS unveils a new method to compare layouts databases using a geometry-based signature enabling a safe and fast traceability process. Read the article on TechDesignForum. As exchanges of layout descriptions between teams... [Continue Reading]

XYALIS at DAC conference 2018 : booth #1610

- Leveraging years of leadership in layout finishing, XYALIS introduces a unique geometry-based signature enabling a safe and fast traceability process. It is tailored to handle the multiplicity of design styles and representation standards specific to electronic... [Continue Reading]

XYALIS at SPIE Photomask conference 2017

- XYALIS will demonstrate his new Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #107 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14,... [Continue Reading]