Mask Data Preparation

  • Generation of Multi Project Wafers (MPWs) or shuttles
  • Generation of complex reticles
  • Intuitive mask set creation
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Dummy Filling

  • 3rd Generation of dummy filling
  • High speed parallel processing
  • Available at chip level, reticle level or wafer level
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  • Powerful toolbox for GDSII, OASIS ®, Mebes operations
  • High reliability for last minute updates
  • Secure your tapeout
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Oct’20: New Release

Grenoble – Oct. 20th, 2020

Today XYALIS unveils a new release bringing new powerful features in mask data preparation and dummy filling tools. It includes a python interpreter for maskset manager and dummy fill tools.

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News & Press

Spie 2020 – Baccus : Maskset automatic flow

- This year SPIE Advanced Lithography conference was online. Here is XYALIS presentation that shows a complete maskset automatic flow management with its mask order form in SEMI P10 format. In this presentation, we see how... [Continue Reading]

MPW Automatic Placement

- Grenoble – May 4th, 2020 –  The new release of our Multi Project Wafers (MPW) automatic placement engine (GOTcross) for MPW projects brings new powerful features. Here are highlights on these advanced features. The possibility to fill... [Continue Reading]

Geometric based signature patent

- Grenoble – March 28th, 2020 XYALIS is proud to announce that a new patent has been filled (#WO2019141942). In this patent, XYALIS provides a new method to compare layout databases using a geometric based signature. When different... [Continue Reading]