Mask Data Preparation
- Generation of Multi Project Wafers (MPWs) or shuttles
- Generation of complex reticles
- Intuitive mask set creation
Toolbox
- Powerful toolbox for GDSII/OASIS ®/Mebes operations
- Direct read and write gzip files
GOTdiff
Layout database comparator:
- Geometry-based signature
- Ultra-fast signature comparison
- Intellectual property protection
- High performance XOR
- Standard error file generation
- Parallelism for unsurpassed performance
- Client/server mode for GUI customization
News & Press
Geometry-based signature for layout database comparison
June 5th, 2018 - News Grenoble – May 31st, 2018 – XYALIS unveils a new method to compare layouts databases using a geometry-based signature enabling a safe and fast traceability process. Read the article on TechDesignForum. As exchanges of layout descriptions... [Continue Reading]
XYALIS at DAC conference 2018 : booth #1610
May 30th, 2018 - News Leveraging years of leadership in layout finishing, XYALIS introduces a unique geometry-based signature enabling a safe and fast traceability process. It is tailored to handle the multiplicity of design styles and representation standards specific to electronic... [Continue Reading]
XYALIS at SPIE Photomask conference 2017
August 29th, 2017 - News XYALIS will demonstrate his new Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #107 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14,... [Continue Reading]
