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Mask Data Preparation

  • Generation of Multi Project Wafers (MPWs) or shuttles
  • Generation of complex reticles
  • Intuitive mask set creation
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Dummy Filling

  • 3rd Generation of dummy filling
  • High speed parallel processing
  • Available at chip level, reticle level or wafer level
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Toolbox

  • Powerful toolbox for GDSII, OASIS ®, Mebes operations
  • High reliability for last minute updates
  • Secure your tapeout
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Reducing stress effect on MPW reticles

Grenoble – Feb. 22nd, 2021

Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodolgy to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online conference, California, USA, 22-26 february 2021.

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News & Press

Reducing stress effects on multi-project-wafer reticles


- Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodolgy to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online... [Continue Reading]

Spie 2020 – Baccus : Maskset automatic flow


- This year SPIE Advanced Lithography conference was online. Here is XYALIS presentation that shows a complete maskset automatic flow management with its mask order form in SEMI P10 format. In this presentation, we see how... [Continue Reading]

Oct’20: New Release


- Grenoble – October 20th, 2020 – Today XYALIS unveils a new release bringing new powerful features in mask data preparation and dummy filling tools. It includes a python interpreter for maskset manager and dummy fill tool.... [Continue Reading]