Mask Data Preparation
- Generation of Multi Project Wafers (MPWs) or shuttles
- Generation of complex reticles
- Intuitive mask set creation
Dummy Filling
- 3rd Generation of dummy filling
- High speed parallel processing
- Available at chip level, reticle level or wafer level
Toolbox
- Powerful toolbox for GDSII, OASIS ®, Mebes operations
- High reliability for last minute updates
- Secure your tapeout
GOTsuite_1910-15
Grenoble – October 15th, 2019
Thanks to our customers’ feedback, today we unveil a new release. It brings a major improvement in resizing geometries and many small but useful features or improvements in other tools. This goes from graphic user interface enhancement to the addition of new options that greatly simplify the integration in any production flow.
News & Press
XYALIS at SPIE Photomask 2019: Large Dies Stitching
July 31st, 2019 - News XYALIS will present a paper about “Large dies stitching: a technical and cross-functional teams challenge.” at the poster session. This paper addresses large dies stitching challenges. Stitching is a way to combine several shots “stitched... [Continue Reading]
New Mask Data Prep Distribution
April 30th, 2019 - News Grenoble – April 30th, 2019 – XYALIS unveils it’s latest tools version. This new semiannual distribution bring major enhancements in our MDP flow (Mask Data Preparation) family tools. After adding connections capabilities to any SQL database... [Continue Reading]
XYALIS at DAC conference 2019 : booth #946
April 12th, 2019 - News XYALIS introduces a SQL Database Communication Link to further integrate its Mask Data Preparation (MDP) suite in customer design and manufacturing flows. The industry now faces new challenges: complex stitching, 3D chips, MPW or... [Continue Reading]
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To build reliable flows involving data exchange with other tools and equipments, XYALIS is fully compliant with SEMI standards. |
