Mask Data Preparation
- Generation of Multi Project Wafers (MPWs) or shuttles
- Generation of complex reticles
- Intuitive mask set creation
Dummy Filling
- 3rd Generation of dummy filling
- High speed parallel processing
- Available at chip level, reticle level or wafer level
Toolbox
- Powerful toolbox for GDSII, OASIS ®, Mebes operations
- High reliability for last minute updates
- Secure your tapeout
XYALIS at DAC Conference 2025: #booth 2628
May 15th, 2025
3D-ICs, stitching, MPWs, PCMs, multi-patterning, or density management create disruptions, bottlenecks, and inefficiencies in your existing Mask Data Preparation flow?
Visit XYALIS @DAC to learn how XYALIS... [Continue Reading]
News & Press
Leveraging the Advantages of OASIS Files
May 6th, 2025 - News The OASIS format (Open Artwork System Interchange Standard) was introduced to address the growing complexity of chip design layouts and to overcome the limitations of the aging GDSII format. While it offers immense potential for... [Continue Reading]
XYALIS at SPIE Photomask conference 2024
October 1st, 2024 - News Time to update your Mask Data Preparation flow? XYALIS offers cutting-edge MDP solutions tailored to your workflow. Work with our customer oriented team to boost your MDP productivity through customized, production-proven engines that seamlessly integrate... [Continue Reading]
XYALIS at DAC Conference 2024: #booth 2516
June 24th, 2024 - News XYALIS celebrates 26 years of providing state-of-the-art software solutions that increase productivity and reliability of Mask Data Preparation (MDP). With tools ranging from Multi Project Wafer (MPW) placement, frame generation, mask set design, field stitching,... [Continue Reading]
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To build reliable flows involving data exchange with other tools and equipments, XYALIS is fully compliant with SEMI standards. |
