Mask Data Preparation
- Generation of Multi Project Wafers (MPWs) or shuttles
- Generation of complex reticles
- Intuitive mask set creation
Dummy Filling
- 3rd Generation of dummy filling
- High speed parallel processing
- Available at chip level, reticle level or wafer level
Toolbox
- Powerful toolbox for GDSII, OASIS ®, Mebes operations
- High reliability for last minute updates
- Secure your tapeout
XYALIS at SPIE Photomask 2022 : Single-pass frame generation for multi-layer 3D circuits
September 15th, 2022
XYALIS will present a paper about “Single-pass frame generation for multi-layer 3D circuits” at the poster session. This paper presents a novel approach to automatically build frames for 3D chips. These chips may be obtained... [Continue Reading]
News & Press
Geometric based signature – EU patent issuance
July 19th, 2022 Grenoble – July 19th, 2022 – XYALIS, is proud to announce that the European Patent Office (EPO) has granted our European patent EP3740889B1 (June 22, 2022). In this patent, XYALIS provides a new method to compare layout databases... [Continue Reading]
XYALIS at DAC conference 2022 : booth #2455
May 19th, 2022 This year at DAC, XYALIS introduces new exciting features in its Mask Data Preparation field of expertise. Thanks to our frame generation automatic tool latest version, GOTframe, producing ultimate 3D frame chips has never been... [Continue Reading]
April’22: New Release
April 19th, 2022 Grenoble – April 19th, 2022 – Today XYALIS unveils a new release bringing powerful improvements in the multi project wafer editor (GOTmuch) and in the frame generation engine (GOTframe). GOTmuch – Multi Project Wafer Editor... [Continue Reading]
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To build reliable flows involving data exchange with other tools and equipments, XYALIS is fully compliant with SEMI standards. |
