XYALIS at DAC conference 2021 : booth #1407

This year at DAC, XYALIS introduces optimized flows in its two areas of expertise.

A new Multi-Project Wafer (MPW) design flow reduces thermal mechanical stress on reticules and improves MPW yield, by leveraging its production-proven Mask Data Preparation tool suite. Thanks to the collaboration with MOSIS and using GOTmuch and GOTfiller, XYALIS has set up a new methodology to improve MPW yield and control CPI. 

A new design-driven dummy fill flow allows for the complete customization of the dummy fill process with respect to design constraints, leveraging XYALIS GOTstyle’s high-performance, low-memory overhead, grid-based dummy fill engine, and increasing automation and productivity of several layout optimization steps: Dummy Fill, Critical Dimension Metrology, Curvilinear Dummy Geometries design, and Guard Ring generation.

See us at DAC 2021:

In San Francisco, December 6-8, on booth #1407.

  • Monday, December 6 from 10:00 am to 6:00 pm
  • Tuesday, December 7 from 10:00 am to 6:00 pm
  • Wednesday, December 8 from 10:00 am to 6:00 pm


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