XYALIS at SPIE Photomask conference 2023

XYALIS celebrates 25 years of providing state-of-the-art software solutions that increase productivity and reliability of Mask Data Preparation (MDP).

With tools ranging from Multi Project Wafer (MPW) placement, frame generation, mask set design, field stitching, mask order form generation, chip and reticle-level dummy fill, and layout manipulation tools, XYALIS automates MDP for the most complex designs with optimum performance and memory usage. A new MPW design flow minimizes die fracture in advanced 3D packaging wafer thinning process.

Focused on ease of use and computing and memory performance, XYALIS MDP tools automate the most repetitive and time demanding steps of mask layouts:

    • Multi-Project Wafers placement optimizing production costs,
    • Frame generation based on intuitive, reusable process specific templates,
    • Mask set layout editing.

MDP Flow

Support for SEMI standards, powerful scripting capabilities, and now a communication link to any SQL database make XYALIS MDP tools easy to integrate in any customer design or manufacturing flow.

Mask set management

See us at SPIE Photomask Conference Technology + EUVL exhibition, Monterey Conference Center,ย 1 Portola Plaza,ย Monterey, CA 93940, USA.

  • Tuesday, October 3rd, 2023, from 10:00 am to 4:00 pm
  • Wednesday, October 4th, 2023, from 9:30 am to 4:00 pm



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