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Versions history

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Here is our tools versions history: GOTsuite_2204-15   Product name Version GOTarc 1.1b GOTcheck 1.5a GOTcif2db 2.2a GOTcross 3.1c GOTcsv2mch 2.0b GOTdb2cif 1.2b GOTdb2ps 1.2b GOTdeck 1.0b GOTdiff 1.4a GOTfig 2.1c GOTfiller 3.1a GOTframe 4.2a GOTghost-shape 2.0c GOTjob2msk 4.3a GOTlabel …

Large dies stitching: A Technical and Cross-Functional Teams Challenge

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Philippe Morey, Frederic Brault, Eric Beisser, Farid BenzakourXYALIS – Grenoble – FranceConference: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States ABSTRACT This paper addresses large dies stitching challenges. Stitching is a way to combine several shots ”stitched …

Customize your editor for XYALIS files

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Configurations and customization files This page contains customization files to improve user interface when editing files for GOTmuch, GOTframe or GOTmask. We provide configuration files for the following editors : Emacs Nedit Vim Emacs Here is the configuration file for …

Layout Database File Control: The Missing Link

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By Dr Philippe Morey-Chaisemartin & Frederic Brault XYALIS, France. Published in TechDesign Forum – May 31st 2018 As the exchange of layout descriptions between teams involved in modern integrated circuit (IC) development and production increase in terms of rate, value …

Automatic pattern localization across layout database and photolithography mask

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Philippe Morey(1), Frederic Brault(1), Eric Beisser(1), Oliver Ache(2), Klaus-Dieter Röth(2)1: XYALIS – France2: KLA-Tencor MIE GmbH, GermanyConference: SPIE© Advanced Lithography, 2016, San Jose, California, United States ABSTRACT Advanced process photolithography masks require more and more controls for registration versus design and …



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