XYALIS at SPIE Photomask conference 2016


XYALIS will demonstrate his integrated Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #114 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14, 2016, in Monterey, California, …

XYALIS at DAC Conference 2016 : booth #1918


Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS phases in a new generation of tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the challenges of today’s most advanced …

Automatic Mask Pattern Localization


In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …

XYALIS supports Fahrenheit2451 project


Grenoble, France – January 22nd, 2016 – XYALIS and ARNANO’s Fahrenheit 2451 Nanoforms combine art and technology and introduce a new way to preserve precious personal data. After the success of the Kickstarter Fahrenheit 2451 project, the first public sapphire …

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