XYALIS at DAC conference 2021 : booth #1407


This year at DAC, XYALIS introduces optimized flows in its two areas of expertise. A new Multi-Project Wafer (MPW) design flow reduces thermal mechanical stress on reticules and improves MPW yield, by leveraging its production-proven Mask Data Preparation tool suite. Thanks …

Design Driven Dummy Filling


XYALIS has set up a new methodology to allow an efficient design driven dummy filling technique. It is used in our dummy filling tool GOTstyle. The result has been presented in a paper during the 2021 International Symposium on Electrical, Electronics …

Geometric based signature – US patent issuance


Grenoble – June 29th, 2021 XYALIS,  is proud to announce that the United States Patent and Trademark Office (USPTO) has issued U.S. Patent No. 10,956,368 (March 23, 2021 – application number 16/961,375, equivalent to European patent #WO2019141942). In this patent, …

May’21: New Release


Grenoble – May 12th, 2021 – Today XYALIS unveils a new release bringing powerful improvements to increase OASIS® reading/writing operations performance.  Compression and decompression functions have been optimized so that reading or writing an OASIS® file with cblocks, which is the …

Reducing stress effects on multi-project-wafer reticles


Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodology to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online conference, California, USA, 22-26 february …

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