Automatic Mask Pattern Localization
In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …
XYALIS supports Fahrenheit2451 project
Grenoble, France – January 22nd, 2016 – XYALIS and ARNANO’s Fahrenheit 2451 Nanoforms combine art and technology and introduce a new way to preserve precious personal data. After the success of the Kickstarter Fahrenheit 2451 project, the first public sapphire …
XYALIS at DAC Conference 2015 : booth #2606
Multi-Project Wafers have never been that easy! With XYALIS GTmuch, the graphical shuttle editor, mask data preparation teams have been able to cut time to designing multi-chip assemblies. With XYALIS GTcross, the production aware placement engine, they have been able …
XYALIS at DAC conference 2014
XYALIS will unveils GTwatermark which secures your flow by warranting the integrity of your reference layout files, at the DAC Conference, June 2nd-4th 2014 in San Francisco, CA, USA – Booth #403. Have you ever wondered if you were using the right …
Soft Biz Day award for GTnano
On 28 november 2013, XYALIS has won the Soft Biz Day trophy for the best hardware & software integrated solution : GTnano enabling long-term archiving solution . With GTnano, documents can be saved on a Nanoform, which is a 4 …
