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News & Press
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XYALIS and SII NanoTechnology announce strategic collaboration
GRENOBLE, France, January 31st, 2011 Chiba, Japan, January 31th, 2011 XYALIS, a leader in Mask Data Preparation software, and SII NanoTechnology, a leader in Photomask Verification software, announced today that they have signed a strategic cooperation agreement to broaden availability …
XYALIS Brings Cost Reduction To Mask Design
GRENOBLE, France, May 26th, 2010 As technology progresses the cost of a complete mask set has been increasing. It is not rare to see a complete mask set reach millions of dollars with the newest technology nodes, a significant part …
XYALIS new version of GTmuch makes multi-chip modules and multi-project wafers even easier
Paris, France – Xyalis has announced a major upgrade to GTmuch, the company’s graphical tool dedicated to floorplanning and assembly of multiple GDSII databases for Multi-Chip Modules (MCM) and Multi-Project Chips or Wafers (MPC or MPW). At the same time Xyalis has updated its complete suite of GDSII utilities.
XYALIS marks North American Operations expansion with official opening of an office in San Jose
GRENOBLE, France, March 21st, 2008 Xyalis marks North American Operations expansion with official opening of an office in San Jose, California, announces Eric Beisser – CEO of Xyalis. Xyalis, the leader in layout finishing solutions, today officially announced the opening …
New release of our hybrid dummy fill tool, GTstyle
GRENOBLE, France, August 21st, 2007 In addition to all exclusive functionnalities such as roughness management or parasitics reduction, GTstyle v2.2 provides new great features: Full Oasis compatibility Management of multiple size dummy cells Automatic interconnection of dummy …
