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Reducing stress effects on multi-project-wafer reticles

Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodology to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online conference, California, USA, 22-26 february …

Spie 2020 – Baccus : Maskset automatic flow

This year SPIE Advanced Lithography conference was online. Here is XYALIS presentation that shows a complete maskset automatic flow management with its mask order form in SEMI P10 format. In this presentation, we see how it is easy to set …

Oct’20: New Release

Grenoble – October 20th, 2020 – Today XYALIS unveils a new release bringing new powerful features in mask data preparation and dummy filling tools. It includes a python interpreter for maskset manager and dummy fill tool. Also to increase OASIS reading/writing …

MPW Automatic Placement

Grenoble – May 4th, 2020 –  The new release of our Multi Project Wafers (MPW) automatic placement engine (GOTcross) for MPW projects brings new powerful features. Here are highlights on these advanced features. The possibility to fill remaining empty space by additional …

Geometric based signature patent

Grenoble – March 28th, 2020 XYALIS is proud to announce that a new patent has been filled (#WO2019141942). In this patent, XYALIS provides a new method to compare layout databases using a geometric based signature. When different teams exchange different versions of …



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