XYALIS at SPIE Advanced Lithography Conference 2013

XYALIS introduces its new highly parallel CMP metal fill engine at the SPIE Advanced Lithography Conference, February 26th-27th 2013 in San Jose, CA, USA – Booth # 205.

SPIE Advanced Lithography Conference 2013

The new GTstyle release maximizes CMP yield with its highly accurate tile insertion algorithm, now running in parallel for unsurpassed speed and low memory consumption:

  • Patented insertion algorithm based on local density and roughness calculations and their variations over large areas minimizes number of inserted tiles.
  • Keep-away function and net balancing around critical nets minimizes parasitic effects.
  • Advanced features like automatic dummy tile sizing and tile interconnection accommodate complex metal fill rules required by high performance designs.
  • Strict compatibility with DRCs.

  The new GTstyle release has been successfully used on a multi-billion transistor processor design using TSMC 28nm process, in a few hours, allowing metal fill to be run as part as the design flow. XYALIS will also present its proven integrated Mask Data Preparation solution automating frame generation, multichip assembly, mask set creation, and mask order form management, which shortens time to manufacturing, increases yield, and removes errors during mask and wafer production. GTstyle & XYALIS Mask Data Preparation solution will be on display at SPIE Advanced Lithography Conference 2013 :

  • Tuesday, February 26th from 10:00 am to 8:00 pm
  • Wednesday, February 27th from 10:00 am to 4:00 pm
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