XYALIS at SPIE Advanced Lithography Conference 2013
XYALIS introduces its new highly parallel CMP metal fill engine at the SPIE Advanced Lithography Conference, February 26th-27th 2013 in San Jose, CA, USA – Booth # 205. The new GTstyle release maximizes CMP yield with its highly accurate tile …
XYALIS at SPIE BACCUS 2012
XYALIS will be present at the SPIE Photomask/Baccus conference, September 11th-12th 2012 in Monterey, CA, USA Booth # 510. XYALIS, the Mask Data Preparation specialist, will present : GTmask : the powerful and fully automated mask set edition tool. It increases productivity …
NanoSkills
XYALIS is a partner of the NanoSkills project. The NanoSkills project is intended to support the development of sectoral qualifications system and frameworks by definition of qualifications of engineers and technicians in nanotechnologies in terms of learning outcomes to promote …
XYALIS Brings Cost Reduction To Mask Design
GRENOBLE, France, May 26th, 2010 As technology progresses the cost of a complete mask set has been increasing. It is not rare to see a complete mask set reach millions of dollars with the newest technology nodes, a significant part …
XYALIS new version of GTmuch makes multi-chip modules and multi-project wafers even easier
Paris, France – Xyalis has announced a major upgrade to GTmuch, the company’s graphical tool dedicated to floorplanning and assembly of multiple GDSII databases for Multi-Chip Modules (MCM) and Multi-Project Chips or Wafers (MPC or MPW). At the same time Xyalis has updated its complete suite of GDSII utilities.
