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Large dies stitching: A Technical and Cross-Functional Teams Challenge
Philippe Morey, Frederic Brault, Eric Beisser, Farid BenzakourXYALIS – Grenoble – FranceConference: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States ABSTRACT This paper addresses large dies stitching challenges. Stitching is a way to combine several shots ”stitched …
Customize your editor for XYALIS files
Configurations and customization files This page contains customization files to improve user interface when editing files for GOTmuch, GOTframe or GOTmask. We provide configuration files for the following editors : Emacs Nedit Vim Emacs Here is the configuration file for …
Layout Database File Control: The Missing Link
By Dr Philippe Morey-Chaisemartin & Frederic Brault XYALIS, France. Published in TechDesign Forum – May 31st 2018 As the exchange of layout descriptions between teams involved in modern integrated circuit (IC) development and production increase in terms of rate, value …
Automatic pattern localization across layout database and photolithography mask
Philippe Morey(1), Frederic Brault(1), Eric Beisser(1), Oliver Ache(2), Klaus-Dieter Röth(2)1: XYALIS – France2: KLA-Tencor MIE GmbH, GermanyConference: SPIE© Advanced Lithography, 2016, San Jose, California, United States ABSTRACT Advanced process photolithography masks require more and more controls for registration versus design and …
Is it time to switch to OASIS.MASK ?
By Dr Philippe Morey-Chaisemartin & Frederic Brault XYALIS, France. A summary of OASIS ® standard advantages and weaknesses is presented, based on six years of experience with customer databases. A new standard, OASIS.MASK, is being introduced to address the requirements specific to …
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