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XYALIS at DAC Conference 2016 : booth #1918

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Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS phases in a new generation of tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the challenges of today’s most advanced …

Automatic Mask Pattern Localization

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In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …

XYALIS supports Fahrenheit2451 project

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Grenoble, France – January 22nd, 2016 – XYALIS and ARNANO’s Fahrenheit 2451 Nanoforms combine art and technology and introduce a new way to preserve precious personal data. After the success of the Kickstarter Fahrenheit 2451 project, the first public sapphire …

XYALIS at DAC Conference 2015 : booth #2606

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Multi-Project Wafers have never been that easy! With XYALIS GTmuch, the graphical shuttle editor, mask data preparation teams have been able to cut time to designing multi-chip assemblies. With XYALIS GTcross, the production aware placement engine, they have been able …

XYALIS at DAC conference 2014

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XYALIS will unveils GTwatermark which secures your flow by warranting the integrity of your reference layout files, at the DAC Conference, June 2nd-4th 2014 in San Francisco, CA, USA – Booth #403. Have you ever wondered if you were using the right …